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High-Vacuum Multi-Target Magnetron Sputtering Coating Equipment
1. Product Description Hard, corrosion-resistant and friction-reducing films, superconducting films, magnetic films, optical films, decorative coatings, and various surface-modified materials with specialized functionalities are prepared using high-vacuum multi-target magnetron sputtering technology. 2. Equipment Features and Advantages The anode-layer ion source enhances the ionization rate, enabling highly efficient and high-quality film deposition. Additionally, pulsed bias reverse sputtering/etching is employed to clean the substrate surface, while a bias electric field further supports the deposition process. The system is equipped with 4 sets of sputtering targets and 1 set of anode-layer ion sources.